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Enhanced Structural and Electrical Properties of Self-Catalysed Indium Tin Oxide Nanostructures through the Control of Deposition Time in Chemical Vapor Deposition
Faculty of Applied Sciences, Universiti Teknologi MARA, Bandar Tun Abdul Razak Jengka , Pahang, Malaysia
*Email Address : aziantysaroni@uitm.edu.my
Abstract : The scalability of deposition techniques remains a significant challenge for the industrial implementation of Indium Tin Oxide (ITO). In this work, self-catalysed growth of ITO nanostructures was prepared using chemical vapor deposition (CVD) to determine the effect of deposition time of 30 minutes, 70 minutes, and 110 minutes on their structural and electrical properties. FESEM revealed that the average diameter of ITO nanostructures decreased at 70 minutes before increasing again at 110 minutes, suggesting uniform growth followed by overgrowth. XRD results showed improved crystallinity with increasing deposition time, as indicated by a larger crystallite size of 105.32 nm and reduced lattice strain to 1.33 x 10-3. Impedance analysis supported these findings, with the lowest charge transfer resistance (Rct) value of 4.0 kΩ and impedance value of 8808 Ω observed at 70 minutes. However, excessive deposition time negatively affected the electrical performance. Overall, 70 minutes was identified as the optimum deposition time for synthesising self-catalysed ITO nanostructures, providing the best balance between structural quality and conductivity. These findings highlight the critical role of deposition time in tailoring the growth and performance of ITO nanostructures, offering valuable insights for scalable fabrication of transparent conductive oxides in optoelectronic and energy-related applications.
Keywords : Indium Tin Oxide (ITO), Self-catalysed growth, Chemical vapor deposition (CVD, Deposition time, Electrical properties