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Numerical Simulation on Optimizing of TiO2 Anti-Reflection Coating on the Performance of Thin Silicon Solar Cell
1FACULTY OF APPLIED SCIENCE, UiTM CAWANGAN PERLIS, ARAU, PERLIS,
2FACULTY OF APPLIED SCIENCE, UiTM CAWANGAN PERLIS, ARAU, PERLIS, Malaysia
3FACULTY OF APPLIED SCIENCE, UiTM SHAH ALAM, SHAH ALAM, SELANGOR, Malaysia
*Email Address : noorsyamcy@uitm.edu.my
Abstract : Solar cells face the disadvantages of high cost, poor reliability, and low conversion efficiency. To overcome many shortcomings of solar cells and optimize the performance of solar cells, coating anti-reflection film is one of the main optimization methods at present, so it is necessary to prepare anti-reflection film with excellent anti-reflection performance. TiO2 as a single layer of anti-reflection coating (ARC) with different thicknesses was designed to investigate the optical properties and the photocurrent density on silicon solar cells under AM1.5G illumination using a wafer ray tracer. The simulation result indicates that 65 nm of TiO2 is the optimum thickness for a good photovoltaic cell because it proposes the highest value of Jmax which is 40.96 mA/cm2 and nearly 100% of absorption of light at the wavelength of 600 nm region compared to others. Optimizing the thickness of ARC material is necessary to enhance the optical properties and photocurrent density of the solar cell to get the device’s better performance.
Keywords : Anti-reflection coating, Silicon Solar Cell, Numerical simulations, TiO2